BlueRun Ventures Portfolio Company Puyu Technology Closes Hundreds of Millions of RMB Financing to Accelerate Nanoimprint Lithography Equipment Commercialization | BlueRun Family

Opening a New Front for China's Semiconductor Breakthrough

For years, high-end lithography equipment has been the "chokepoint" constraining China's chip industry upgrade. As the global semiconductor sector turns its attention to nanoimprint lithography — a breakthrough technology path — a rising startup born in Suzhou Industrial Park is making rapid strides.

Puyu Technology (Suzhou) Co., Ltd., founded just over a year ago, has leveraged more than two decades of technical accumulation and commercialization to complete three consecutive funding rounds, raising hundreds of millions of RMB in total. BlueRun Ventures was the angel-round investor in Puyu Technology. The company's shareholders also include financial investors such as Yuanhe Origin and QF Capital, industrial investor China Merchants Capital, and government-backed investment platforms including Yuanhe Holdings and the Shanghai Science and Technology Innovation Fund.

With the synergistic support of this "financial + industrial + government" coalition, the company has quickly grown into a domestic leader in nanoimprint lithography equipment, carving out an entirely new track for China's semiconductor equipment sector to break through.

At its core, competition in the semiconductor industry is competition over high-end equipment. Lithography, the most technically complex and costliest step in chip manufacturing, accounts for over 30% of total production costs and nearly 50% of production cycle time. For years, China has been constrained by overseas technology monopolies in advanced-node lithography equipment. The rise of nanoimprint lithography offers a historic opportunity to break this pattern.

Compared with traditional EUV lithography systems, nanoimprint equipment costs only a fraction to purchase and can reduce manufacturing costs by 40%, while delivering ultra-high resolution and significantly lower energy consumption — making it widely regarded in the industry as the next-generation core lithography technology with the potential to replace EUV. Currently, international semiconductor equipment giants have already pushed nanoimprint technology to commercial breakthrough, with related equipment being adopted by global memory leaders such as SK Hynix and Kioxia, marking the technology's formal entry into an industrial inflection point.

Puyu Technology's founding team has spent years in the nanoimprint and semiconductor equipment fields, bringing together senior experts in lithography technology, precision manufacturing, semiconductor process engineering, and commercialization. The team possesses top-tier R&D capabilities, mature engineering experience, and market development expertise.

The company has assembled an elite team covering the full chain from hardware and software development, precision process engineering, mechanical design, supply chain management, to client-side delivery. Core members hail from renowned domestic and international semiconductor equipment companies, with long-standing technical accumulation and mass production experience in high-precision overlay alignment, lithography accuracy, and yield control — forming a complete closed-loop capability from frontier technology R&D to industrial commercialization.

As a milestone product for commercialization, Puyu Technology's first nanoimprint lithography system has entered the critical final stage of assembly and commissioning. This system will first be deployed in the strategic high ground of AI and optical interconnects, equipped with multiple self-developed core technology modules. Its key performance indicators in alignment precision and imprint speed have reached leading levels, with broad applicability across multiple downstream scenarios.

The company stated that it will seize the critical window for nanoimprint technology commercialization, driving forward with a "technology breakthrough + industrial deployment" dual-engine strategy to accelerate core equipment iteration and scaled delivery — injecting independent innovation momentum into China's high-end equipment industry to overcome technical bottlenecks and achieve high-quality development, while opening up a differentiated competitive track.

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