Code Engraving | Breaking Through the 14nm Process Inspection Barrier: Suzhou Xihang Semiconductor Technology Co., Ltd.'s TB2000 Bright-Field Nano-Patterned Wafer Defect Inspection Equipment Opens a New Chapter for Domestic Defect Detection

On March 26, Suzhou Xihang Semiconductor Technology Co., Ltd. ("Xihang") announced that its TB2000 bright-field nano-pattern wafer defect inspection equipment has officially passed in-house validation and will be formally launched at SEMICON 2025 (Booth T0-117).

This marks the company's achievement of 14nm and below advanced process node capabilities for volume production inspection. It follows the TB1500's breakthrough at the 40nm node, representing another milestone in Xihang's push to localize high-end inspection equipment.

Core Technology Developed In-House

The TB2000 features a fully self-developed high-power broadband laser-driven plasma light source system and a deep-ultraviolet high-throughput high-image-quality imaging system, paired with high-line-rate TDI cameras and an ultra-precision high-speed motion platform. Combined with AI image processing algorithms and Design CA, it significantly boosts defect detection sensitivity and throughput.

With the TB2000 launch, Xihang joins the small group of global vendors capable of delivering bright-field inspection equipment for the 14nm node and below, gradually enabling domestic alternatives for advanced process defect inspection.

Tiered Product Matrix Covers All Nodes

Xihang's current product portfolio now spans the full range of bright-field defect inspection across all process nodes. The TB1000/TB1100 (65–90nm), TB1500 (40nm), and TB2000 (14nm) form a complete process-node adaptation system, fully addressing bright-field defect inspection needs for logic, memory, and other process flows. This tiered layout both secures a commercial闭环 for R&D investment and builds momentum for continued breakthroughs at more advanced nodes. The technical evolution from TB1000 to TB2000 reflects Xihang's shift from chasing international leaders to running alongside them.